The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 03, 2010
Filed:
Sep. 21, 2006
Shiro Eguchi, Chiba, JP;
Isao Hashimoto, Hitachi, JP;
Shigekatsu Sato, Hitachi, JP;
Hidenobu Koide, Ichihara, JP;
Nobuyuki Hashimoto, Ichihara, JP;
Takayuki Suzuki, Kisarazu, JP;
Satoru Gozaki, Ichihara, JP;
Tomoyuki Hikosaka, Ichihara, JP;
Yukio Okamoto, Kisarazu, JP;
Hiroyuki Fujita, Hitachi-Ohta, JP;
Shiro Eguchi, Chiba, JP;
Isao Hashimoto, Hitachi, JP;
Shigekatsu Sato, Hitachi, JP;
Hidenobu Koide, Ichihara, JP;
Nobuyuki Hashimoto, Ichihara, JP;
Takayuki Suzuki, Kisarazu, JP;
Satoru Gozaki, Ichihara, JP;
Tomoyuki Hikosaka, Ichihara, JP;
Yukio Okamoto, Kisarazu, JP;
Hiroyuki Fujita, Hitachi-Ohta, JP;
Japan AE Power Systems Corporation, Tokyo, JP;
Abstract
There are provided an electron beam application method and an electron beam application device capable of uniformly applying electron beams to an object even if the electron beams have a low energy. For this, electron beams (EB) are applied to a beverage container () (object) within a magnetic barrier (MF) formed by combining a plurality of magnetic fields generated in an electron beam application region.