The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 03, 2010
Filed:
Feb. 10, 2005
Applicant:
Mitsuaki Sugine, Kawasaki, JP;
Inventor:
Mitsuaki Sugine, Kawasaki, JP;
Assignee:
Sharp Kabushiki Kaisha, Osaka, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); G02F 1/13 (2006.01);
U.S. Cl.
CPC ...
Abstract
In the manufacturing method of the array substrate, an under layer having a surface with irregular irregularities is formed on a substrate, a metal film with irregularities profiling the surface of the under layer is formed on the under layer, a colored resist layer is formed on the metal film, the colored resist layer is patterned to form a regularly arranged colored resist pattern, an optical inspection is performed to optically detect a defect of the colored resist pattern, a defect of the colored resist pattern detected by the optical inspection is repaired; and the metal film is etched while using the resist pattern as a mask.