The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 03, 2010
Filed:
May. 22, 2007
Hiroshi Yoshida, Mito, JP;
Hideki Nagano, Tsukuba, JP;
Hirokazu Hasegawa, Kyoto, JP;
Mikihito Takenaka, Kyoto, JP;
Feng Chen, Kyoto, JP;
Hiroshi Yoshida, Mito, JP;
Hideki Nagano, Tsukuba, JP;
Hirokazu Hasegawa, Kyoto, JP;
Mikihito Takenaka, Kyoto, JP;
Feng Chen, Kyoto, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
It is an object to provide a microstructure having cylindrical microdomains oriented in the film thickness direction and arranged in a regular pattern, for which a microphase separation phenomenon of a block copolymer is utilized. The process for producing the microstructure includes 2 steps; the first step for arranging, on a substrate (), a polymer layer at least containing a block copolymer having a first block which constitutes a continuous phase () of the microstructure () and a second block which constitutes microdomains () dispersed in the continuous phase () and oriented in the thickness direction; and second step for thermally treating the substrate () at a neutral temperature (Tn), at which a first material (A) and second material (B) which constitute the respective first and second blocks have substantially the same interfacial tension with the substrate () surface (X).
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile