The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 03, 2010

Filed:

Mar. 30, 2006
Applicants:

Masaaki Sasaki, Kamisu, JP;

Kouji Maeba, Kamisu, JP;

Mitsunaga Douzaki, Kamisu, JP;

Hirofumi Takahashi, Kamisu, JP;

Osamu Hososaka, Minato-ku, JP;

Inventors:

Masaaki Sasaki, Kamisu, JP;

Kouji Maeba, Kamisu, JP;

Mitsunaga Douzaki, Kamisu, JP;

Hirofumi Takahashi, Kamisu, JP;

Osamu Hososaka, Minato-ku, JP;

Assignee:

Mitsui Chemicals, Inc., Minato-Ku, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B01J 19/18 (2006.01); C07C 211/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

An apparatus for continuously producing polyisocyanate is provided for quickly contacting polyamine and carbonyl chloride in order to suppress an undesirable reaction between polyamine and polyisocyanate so that a by-product can be reduced and the yield of polyisocyanate can be improved. In a circulatory line, a material-mixing portion, a high-shear pump, a reactor, a liquid-feeding pumpand a coolerare interposed in series along the direction of the flow of a reaction solution, thereby forming a closed line. In this apparatus, after polyamine and carbonyl chloride are supplied in the material-mixing portion, the reaction solution is sheared by the high-shear pumpin a state where the contact of the polyamine with the reaction solution is minimized. Thus, the formation of a urea compound as a by-product can be suppressed and the yield of polyisocyanate can be improved.


Find Patent Forward Citations

Loading…