The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 03, 2010
Filed:
Mar. 25, 2008
Chia-hsuan Pai, Hsin-Chu, TW;
Chung-ching Hsieh, Hsin-Chu, TW;
Te-sheng Chen, Hsin-Chu, TW;
Sugiura Norio, Hsin-Chu, TW;
Chia-Hsuan Pai, Hsin-Chu, TW;
Chung-Ching Hsieh, Hsin-Chu, TW;
Te-Sheng Chen, Hsin-Chu, TW;
Sugiura Norio, Hsin-Chu, TW;
AU Optronics Corp., Hsin-Chu, TW;
Abstract
A liquid crystal (LC) medium for polymerization alignment process includes at least a set of LC molecules, at least a set of reactive monomers, and at least one inhibitor at a concentration in a range of 0.01-1% wt of the reactive monomer. The inhibitor quenches polymerization of radicals of the reactive monomers, which is triggered by light or heat before the polymerization alignment process. Therefore influence on the reactive monomers before the polymerization alignment process is reduced and stability of the LC medium is improved.