The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 03, 2010
Filed:
Jan. 05, 2006
Jin Kyoo Kim, Suwon, KR;
Sang Jin Han, Suwon, KR;
Hee Cheol Kang, Suwon, KR;
Eu Gene Kang, Suwon, KR;
Tae Hyung Kim, Yongin, KR;
Jin Kyoo Kim, Suwon, KR;
Sang Jin Han, Suwon, KR;
Hee Cheol Kang, Suwon, KR;
Eu Gene Kang, Suwon, KR;
Tae Hyung Kim, Yongin, KR;
Samsung Mobile Display Co., Ltd., Yongin, KR;
Abstract
Disclosed is a method of forming a pattern on a mask sheet including an attaching portion to be attached to a mask frame, and a pattern area in which the pattern is formed. The method includes positioning the mask sheet on an auxiliary sheet with a thickness greater than the thickness of the mask sheet, fastening the auxiliary sheet to the mask frame, applying a stretching force to the mask sheet and the auxiliary sheet, and forming the pattern on the pattern area of the mask sheet. Thus, a predetermined pattern is formed on a mask sheet while a uniformly distributed external force is applied to the mask sheet, so that bending or deflecting out of plane by the mask sheet is prevented, thereby forming a precise mask pattern.