The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 27, 2010
Filed:
Sep. 18, 2008
Anthony Gus Aipperspach, Rochester, MN (US);
Toshiaki Kirihata, Poughkeepsie, NY (US);
Phil Christopher Felice Paone, Rochester, MN (US);
Brian Joy Reed, Rochester, MN (US);
John Matthew Safran, Wappingers Falls, NY (US);
David Edward Schmitt, Rochester, MN (US);
Gregory John Uhlmann, Rochester, MN (US);
Anthony Gus Aipperspach, Rochester, MN (US);
Toshiaki Kirihata, Poughkeepsie, NY (US);
Phil Christopher Felice Paone, Rochester, MN (US);
Brian Joy Reed, Rochester, MN (US);
John Matthew Safran, Wappingers Falls, NY (US);
David Edward Schmitt, Rochester, MN (US);
Gregory John Uhlmann, Rochester, MN (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method and circuit for implementing precise eFuse resistance measurement, and a design structure on which the subject circuit resides are provided. An eFuse sense amplifier coupled to an eFuse array and used for current measurements includes balanced odd and even bitlines, and a plurality of programmable reference resistors connected to the balanced odd and even bitlines. First a baseline current measurement is made through one of the programmable reference resistors, and used to identify a network baseline resistance. A current measurement is made for an eFuse path including a selected eFuse and used to identify the resistance of the selected eFuse.