The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 27, 2010
Filed:
Apr. 16, 2007
Yoshikazu Sawada, Tokyo, JP;
Norio Takahashi, Tokyo, JP;
Masaru Hirose, Tokyo, JP;
Mitsuo Otsuki, Tokyo, JP;
Shoji Toyoda, Hong Kong, CN;
Anthony Wai Yuen Lai, Hong Kong, CN;
Yoshikazu Sawada, Tokyo, JP;
Norio Takahashi, Tokyo, JP;
Masaru Hirose, Tokyo, JP;
Mitsuo Otsuki, Tokyo, JP;
Shoji Toyoda, Hong Kong, CN;
Anthony Wai Yuen Lai, Hong Kong, CN;
TDK Corporation, Tokyo, JP;
SAE Magnetics (H.K.) Ltd., N.T. Hong Kong, CN;
Abstract
Provided is a smear-removing method that can remove smear of a manufactured thin-film magnetic head. The method is performed to a thin-film magnetic head including an MR effect element for reading data having two electrode layers sandwiching an MR effect multilayer as a magneto-sensitive portion therebetween. The method comprises the step of applying a stress voltage less than a breaking voltage of the MR effect element between the two electrode layers to burn off smear. In the method, it is preferable that the stress voltage is applied while an electric resistance or an output voltage of the MR effect element is measured, and the stress voltage is increased until the value of the electric resistance or the output voltage reaches an upper limit specified value specified from a value of an electric resistance or an output voltage in a normal case where smear is not present.