The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 27, 2010
Filed:
Apr. 06, 2007
Martin E. Banton, Fairport, NY (US);
Dale R. Mashtare, Bloomfield, NY (US);
Paul A. Hosier, Rochester, NY (US);
Martin E. Banton, Fairport, NY (US);
Dale R. Mashtare, Bloomfield, NY (US);
Paul A. Hosier, Rochester, NY (US);
Xerox Corporation, Norwalk, CT (US);
Abstract
A system is provided for measuring gloss and spatial dependence of gloss. In a first embodiment, the system comprises: a first illuminator configured to emit a first light beam at a point on a target, thereby producing a generally specular reflectance in a first direction; a second illuminator configured to emit a second light beam at the point on the target, thereby producing generally diffuse reflectance in the first direction; a linear array sensor configured to detect the generally specular reflectance and the generally diffuse reflectance in the first direction; and a processor configured to process the generally specular reflectance and the generally diffuse reflectance detected by the linear array sensor. In a second embodiment, the system comprises: an illuminator configured to emit a beam of light at a point on a target, thereby producing a generally specular reflectance in a first direction and generally diffuse reflectance in a second direction; a first linear array sensor configured to detect the generally specular reflectance in the first direction; a second linear array sensor configured to detect the generally diffuse reflectance in the second direction; and a processor configured to process the generally specular reflectance detected by the first linear array sensor and the generally diffuse reflectance detected by the second linear array sensor.