The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 27, 2010
Filed:
Apr. 28, 2006
William M. Tong, Palo Alto, CA (US);
Duncan Stewart, Palo Alto, CA (US);
R. Stanley Williams, Palo Alto, CA (US);
Manish Sharma, New Delhi, IN;
Zhiyong LI, Palo Alto, CA (US);
Gary A. Gibson, Palo Alto, CA (US);
William M. Tong, Palo Alto, CA (US);
Duncan Stewart, Palo Alto, CA (US);
R. Stanley Williams, Palo Alto, CA (US);
Manish Sharma, New Delhi, IN;
Zhiyong Li, Palo Alto, CA (US);
Gary A. Gibson, Palo Alto, CA (US);
Hewlett-Packard Development Company, L.P., Houston, TX (US);
Abstract
A method of forming an electrical interconnect, which includes a first electrode, an interlayer of a programmable material disposed over at least a portion of the first electrode, and a second electrode disposed over the programmable material at a non-zero angle relative to the first electrode. The interlayer includes a modified region having differing electrical properties than the rest of the interlayer, sandwiched at the junction of the first electrode and the second electrode. The interlayer may be exposed to a focused beam to form the modified region.