The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 27, 2010
Filed:
Jan. 10, 2006
Michael D. Turner, San Antonio, TX (US);
Ritwik Chatterjee, Austin, TX (US);
Stanley M. Filipiak, Pflugerville, TX (US);
Michael D. Turner, San Antonio, TX (US);
Ritwik Chatterjee, Austin, TX (US);
Stanley M. Filipiak, Pflugerville, TX (US);
Freescale Semiconductor, Inc., Austin, TX (US);
Abstract
A method is provided for creating a barrier layer () on a substrate comprising a dielectric layer () and a metal interconnect (). In accordance with the method, the substrate is treated with a first plasma comprising helium, thereby forming a treated substrate. The treated substrate is then exposed to a second plasma selected from the group consisting of oxidizing plasmas and reducing plasmas. Next, a barrier layer is created on the treated substrate.