The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 27, 2010

Filed:

Oct. 16, 2007
Applicants:

Kevin B. Ray, Fort Collins, CO (US);

Ting Tao, Fort Collins, CO (US);

Gary R. Miller, Fort Collins, CO (US);

Eric E. Clark, Loveland, CO (US);

Melanie Roth, Loveland, CO (US);

Inventors:

Kevin B. Ray, Fort Collins, CO (US);

Ting Tao, Fort Collins, CO (US);

Gary R. Miller, Fort Collins, CO (US);

Eric E. Clark, Loveland, CO (US);

Melanie Roth, Loveland, CO (US);

Assignee:

Eastman Kodak Company, Rochester, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C 1/805 (2006.01); G03F 7/00 (2006.01); G03F 7/26 (2006.01);
U.S. Cl.
CPC ...
Abstract

An imaged and developed element, such as a lithographic printing plate, is provided by infrared radiation imaging of a negative-working imagable element having an outermost imagable layer that includes a free radically polymerizable component, a free radical initiator composition comprising a diaryliodonium borate, and an infrared radiation absorbing compound. The imagable layer also includes a polymeric binder that is represented by the following Structure (I):-(A)-(A')-  (I)wherein A represents recurring units comprising a pendant reactive vinyl group, A′ represents recurring units other than those represented by A, w is from about 1 to about 70 mol %, and w′ is from about 30 to about 99 mol %. The imagewise exposed element is developed with a gum to remove only the non-exposed regions. The gum has a pH greater than 7 and up to about 11 and at least 1 weight % of an anionic surfactant.


Find Patent Forward Citations

Loading…