The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 27, 2010
Filed:
Jan. 26, 2005
Jean-louis Stehle, Colombes, FR;
Jean-Louis Stehle, Colombes, FR;
Societe de Production et de Recherches Appliquees Sopra, Colombes, FR;
Abstract
A mask (MM) with patterns (MF) for use in a reflection lithography device with a photon beam with a wavelength of less than about 120 nm. Said mask (MM) comprises a planar substrate (ST) fixed to a reflecting structure (SMR) comprising a front face provided with selected patterns (MF) made from a material which is absorbent at the given wavelength and further comprises protection means (SP) which are transparent to the given wavelength and arranged such as to maintain a distance (H) between the perturbing particles (PP) and the patterns (MF) greater than or equal to one of the values of the depth of focus of the lithographic device and the height associated with the percentage of photon absorption by the perturbing particles (PP) which is acceptable.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile