The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 27, 2010
Filed:
Dec. 19, 2003
Hiroshi Maruyama, Chiba, JP;
Tsutomu Mochizuki, Chiba, JP;
Takashi Inoue, Chiba, JP;
Daisankasei Co., Ltd., Tokyo, JP;
Abstract
A method for improving the heat stability of polyparaxylylene and a derivative film thereof to improve the heat resistance of the polyparaxylylene and the derivative film thereof without deteriorating deposition characteristics or profitability, and a polyparaxylylene derivative whose heat resistance is improved are provided. When the polyparaxylylene or the derivative film thereof represented by a below-described general formula 1 is formed by a chemical vapor deposition method, an amino-(2.2)-paracyclophane compound represented by a below-described general formula 3 is mixed in a (2.2)-paracyclophane compound represented by a below-described general formula 2 to form a film. (In the formula 1, Xand Xdesignate hydrogen, lower alkyl or halogen. Xand Xmay be the same or different. n represents a degree of polymerization.) (In the formula 2, Xand Xhave the same meanings as those of the formula 1.) (In the formula 3, Xdesignates hydrogen or a lower alkyl group. Yand Ydesignate hydrogen or an amino group and both Yand Yare not hydrogens at the same time.)