The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 27, 2010

Filed:

Jan. 29, 2008
Applicants:

Steve Dai, Gilbert, AZ (US);

Hao LI, Chandler, AZ (US);

Inventors:

Steve Dai, Gilbert, AZ (US);

Hao Li, Chandler, AZ (US);

Assignee:

Motorola, Inc., Schaumburg, IL (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05D 5/12 (2006.01); C08F 2/48 (2006.01); C08F 2/46 (2006.01); G02B 26/02 (2006.01); G02B 26/08 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of forming a matrix of electrowetting pixels includes forming a patterned layer of electrodes () on a substrate () and forming a patterned insulating layer () on the electrodes () and the substrate () to define a plurality of wells (), each of the wells () aligned over one of the electrodes (). A hydrophobic material () is formed on the bottom surfaces of the wells () and a hydrophilic material () is formed on sidewalls () of the wells (), for example by one of selective reaction, selective deposition and selective etching, by the application of a beam () at an angle to impact the sidewalls () while substantially avoiding impacting the bottom surface (). First and second liquids () are disposed within the wells (), the first liquid being not soluble in the second liquid.


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