The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 20, 2010
Filed:
Jun. 14, 2007
Applicants:
Johannes Antoon Hartsuiker, Eindhoven, NL;
Marco Korsten, Eindhoven, NL;
Mattheus Jacobus Nicolaas Van Stralen, Tilburg, NL;
Rob Hubertus Matheus Deckers, Eindhoven, NL;
Inventors:
Johannes Antoon Hartsuiker, Eindhoven, NL;
Marco Korsten, Eindhoven, NL;
Mattheus Jacobus Nicolaas Van Stralen, Tilburg, NL;
Rob Hubertus Matheus Deckers, Eindhoven, NL;
Assignee:
Draka Comteq B.V., Amsterdam, NL;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H05B 31/26 (2006.01);
U.S. Cl.
CPC ...
Abstract
The present invention relates to an apparatus for carrying out a plasma chemical vapor deposition process by which one or more layers of doped or undoped silica can be deposited on the interior of an elongated glass substrate tube. The present invention further relates to a method for manufacturing an optical fiber using such an apparatus.