The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7759630 B1

PDF
Full Text
Expired
Date of Patent:
Jul. 20, 2010

Filed:

Dec. 26, 2006
Applicants:

Hendrik F. Hamann, Yorktown Heights, NY (US);

Chie Ching Poon, San Jose, CA (US);

Timothy Carl Strand, San Jose, CA (US);

Inventors:

Hendrik F. Hamann, Yorktown Heights, NY (US);

Chie Ching Poon, San Jose, CA (US);

Timothy Carl Strand, San Jose, CA (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 3/14 (2006.01); H01J 5/16 (2006.01);
U.S. Cl.
CPC ...
Abstract

Methods and devices for generating multiple, closely spaced, independently controlled near-field light sources are disclosed. By providing an aperture having at least two, orthogonally oriented ridge structures, two or more closely spaced near-field light sources can be generated by controlling the polarization direction of the illuminating radiation. Control of the shape of the aperture, and relative dimensions of the ridge structures allows optimization of the relative intensities of the near-field sources.


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