The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 20, 2010
Filed:
Jul. 12, 2007
Hyun Sik Seo, Gyeonggi-Do, KR;
Yun Ho Jung, Seoul, KR;
Young Joo Kim, Gyeonggi-Do, KR;
Jaesung You, Seoul, KR;
Hyun Sik Seo, Gyeonggi-Do, KR;
Yun Ho Jung, Seoul, KR;
Young Joo Kim, Gyeonggi-Do, KR;
JaeSung You, Seoul, KR;
LG Display Co., Ltd., Seoul, KR;
Abstract
A crystallization method and system are provided which improve a crystallization process by deciding a best-fit focal plane for a laser beam using a test mask and then applying the decided best-fit focal plane to the crystallization process. The crystallization method includes loading a test mask on a mask stage; deciding a best-fit focal plane by performing a crystallization test using the test mask, checking the test result and deciding conditions of a best-fit focal plane from the test result; moving the mask stage to a position corresponding to the best-fit focal plane; loading a mask for crystallization process onto the moved mask stage; and performing the crystallization process using the mask for crystallization process.