The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 20, 2010
Filed:
Sep. 20, 2007
Volatile copper(1) complexes and processes for deposition of copper films by atomic layer deposition
Applicants:
Alexander Zak Bradley, Drexel Hill, PA (US);
Jeffery Scott Thompson, West Chester, PA (US);
Kyung-ho Park, Wilmington, DE (US);
Inventors:
Alexander Zak Bradley, Drexel Hill, PA (US);
Jeffery Scott Thompson, West Chester, PA (US);
Kyung-Ho Park, Wilmington, DE (US);
Assignee:
E.I. du Pont de Nemours and Company, Wilmington, DE (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07F 1/08 (2006.01); B32B 15/04 (2006.01); C23C 16/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
Provided are novel 1,3-diimine copper complexes, and processes for using 1,3-diimine copper complexes in the deposition of copper on substrates, or in or on porous solids, by atomic layer deposition.