The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 20, 2010
Filed:
Aug. 22, 2007
Steffen Meyer, Dresden, DE;
Rolf Weis, Dresden, DE;
Burkhard Ludwig, Munich, DE;
Christoph Noelscher, Nuremberg, DE;
Steffen Meyer, Dresden, DE;
Rolf Weis, Dresden, DE;
Burkhard Ludwig, Munich, DE;
Christoph Noelscher, Nuremberg, DE;
Qimonda AG, Munich, DE;
Abstract
A method of fabricating an integrated circuit, including the steps of forming a first mask layer in the form of a hard mask layer including a plurality of first openings and a second mask layer with at least one second opening which at least partially overlaps with one of the first openings, wherein the at least one second opening is generated lithographically; and at least two neighboring first openings are distanced from each other with a center to center pitch smaller than the resolution limit of the lithography used for generating the second opening.