The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 20, 2010
Filed:
Nov. 30, 2007
Sang Wook Ryu, Cheongju-si, KR;
Man Ghil Han, Ulsan, KR;
Sang Wook Ryu, Cheongju-si, KR;
Man Ghil Han, Ulsan, KR;
Dongbu Hitek Co., Ltd., Seoul, KR;
Abstract
A method for forming a trench isolation in a semiconductor device is provided. This is a novel method for rounding the top corners of trench isolations. The method ensures that rounded corner portions with a uniform shape are consistently formed regardless of the pattern densities of active areas. The method increases the reliability of semiconductor integrated circuit devices, without degrading electrical characteristics, and making it easier to achieve high integration and performance in semiconductor integrated circuit devices.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile