The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7759200 B1

PDF
Full Text
Expired
Date of Patent:
Jul. 20, 2010

Filed:

Apr. 29, 2009
Applicants:

Donald Ray Disney, Cupertino, CA (US);

Cho Chiu MA, Hong Kong, CN;

Inventors:

Donald Ray Disney, Cupertino, CA (US);

Cho Chiu Ma, Hong Kong, CN;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/336 (2006.01);
U.S. Cl.
CPC ...
Abstract

A lateral trench MOSFET includes a trench containing a device segment and a gate bus segment. The gate bus segment of the trench is contacted by a conductive plug formed in a dielectric layer overlying the substrate, thereby avoiding the need for the conventional surface polysilicon bridge layer. The conductive plug is formed in a substantially vertical hole in the dielectric layer. The gate bus segment may be wider than the device segment of the trench. A method includes forming a shallow trench isolation (STI) while the conductive material in the trench is etched.


Find Patent Forward Citations

Disney, Donald. (2010). Method of forming lateral trench mosfet with direct trench polysilicon contact (U.S. Patent No. 7759200). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7759200

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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