The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 20, 2010
Filed:
Sep. 02, 2005
Qing Dai, San Jose, CA (US);
Hoa Van DO, Fremont, CA (US);
Min Xiao, San Jose, CA (US);
Bing K Yen, Cupertino, CA (US);
Qing Dai, San Jose, CA (US);
Hoa Van Do, Fremont, CA (US);
Min Xiao, San Jose, CA (US);
Bing K Yen, Cupertino, CA (US);
Hitachi Global Storage Technologies Netherlands B.V., Amsterdam, NL;
Abstract
A SiON overcoat for use on magnetic media for magnetic recording. The SiON overcoat is deposited by pulsed DC sputtering while applying a negative DC bias. The SiON overcoat is especially useful on perpendicular magnetic recording media because of its ability to deposit thinly and evenly on a rough, granular high coercivity recording media while maintaining excellent corrosion protection properties. A SiON overcoat can be applied less than 3 nm thick while still maintaining excellent mechanical and corrosion protection. The overcoat also has a very high density and water contact angle.