The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 20, 2010
Filed:
Sep. 16, 2005
Liang Liu, Beijing, CN;
Jie Tang, Beijing, CN;
Peng Liu, Beijing, CN;
Zhao-fu HU, Beijing, CN;
Bing-chu Du, Beijing, CN;
Cai-lin Guo, Beijing, CN;
Pi-jin Chen, Beijing, CN;
Shuai-ping GE, Beijing, CN;
Shou-shan Fan, Beijing, CN;
Liang Liu, Beijing, CN;
Jie Tang, Beijing, CN;
Peng Liu, Beijing, CN;
Zhao-Fu Hu, Beijing, CN;
Bing-Chu Du, Beijing, CN;
Cai-Lin Guo, Beijing, CN;
Pi-Jin Chen, Beijing, CN;
Shuai-Ping Ge, Beijing, CN;
Shou-Shan Fan, Beijing, CN;
Tsinghua University, Beijing, CN;
Hon Hai Precision Industry Co., Ltd., Tu-Cheng, Taipei Hsien, TW;
Abstract
A method for making a reference leak includes the steps of: (a) preparing a substrate; (b) forming a patterned catalyst layer on the substrate, the patterned catalyst layer comprising one or more catalyst blocks; (c) forming one or more elongate nano-structures extending from the corresponding catalyst blocks by a chemical vapor deposition method; (d) forming a leak layer of one of a metallic material, a glass material, and a ceramic material on the substrate with the one or more elongate nano-structures partly or completely embedded therein; and (e) removing the one or more elongate nano-structures and the substrate to obtain a reference leak with one or more leak holes defined therein.