The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7757125 B1

PDF
Full Text
Expired
Date of Patent:
Jul. 13, 2010

Filed:

Feb. 16, 2007
Applicants:

Kathryn Allyn Bassin, Harpursville, NY (US);

Clyde J. Bearss, Marietta, GA (US);

Linda Marie Clough, South Windsor, CT (US);

Susan Eileen Skrabanek, Talking Rock, GA (US);

Crystal Faye Springer, Marietta, GA (US);

Inventors:

Kathryn Allyn Bassin, Harpursville, NY (US);

Clyde J. Bearss, Marietta, GA (US);

Linda Marie Clough, South Windsor, CT (US);

Susan Eileen Skrabanek, Talking Rock, GA (US);

Crystal Faye Springer, Marietta, GA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06F 11/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Methods, systems, and articles of manufacture for analyzing defects associated with a software development project. Descriptions of defects identified during the testing of a software product may be stored in a data structure. One or more of the defects may be identified as data defects. If data defects are determined to be the dominant class of defects in the data structure, the data defects may be analyzed to determine a cause for one or more data defects. For example, the focus areas affected by the defects, the trends over time of the defects, the particular types of the data defects, the stability of the system, etc. may be analyzed to determine a cause for the data defects. Therefore, corrective measures may be taken based on the identified cause of the one or more data defects.


Find Patent Forward Citations

Bassin, Kathryn. (2010). Defect resolution methodology and data defects quality/risk metric model extension (U.S. Patent No. 7757125). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7757125

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