The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 13, 2010
Filed:
Mar. 21, 2007
Daniel Krausse, Freiburg, DE;
Christoph Gerhardt, Freiburg, DE;
Peter Riessle, St. Märgen, DE;
Thomas Kirchmeier, Teningen, DE;
Erich Pivit, Allmersbach im Tal, DE;
Daniel Krausse, Freiburg, DE;
Christoph Gerhardt, Freiburg, DE;
Peter Riessle, St. Märgen, DE;
Thomas Kirchmeier, Teningen, DE;
Erich Pivit, Allmersbach im Tal, DE;
HUETTINGER Elektronik GmbH + Co. KG, Freiburg, DE;
Abstract
An HF plasma process excitation configuration includes an HF generator that is connected to a plasma load through a directional coupler. The directional coupler includes a transmission line, a first coupling line for detecting reflected power from the plasma load, and a second coupling line for detecting forward power from the HF generator, is the first coupling line is spaced apart from the transmission line and is terminated at least at one end with a termination resistance. The second coupling line is spaced apart from the transmission line and is terminated at least at one end with a termination resistance. Each coupling line has a predetermined and adjusted characteristic impedance, and the termination resistances each have a resistance value that corresponds within a tolerance to the characteristic impedance of the associated coupling line with a tolerance.