The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 13, 2010
Filed:
Jun. 24, 2005
Sang Man Bae, Seoul, KR;
Sang Man Bae, Seoul, KR;
Hynix Semiconductor Inc., Icheon-si, KR;
Abstract
A photo mask and a semiconductor device fabricated using the same is disclosed. The photo mask to form a mask pattern defining a STAR gate region includes a transparent substrate, and a light-shielding pattern defining a zigzag W-STAR gate region, wherein a waved portion of the light-shielding pattern partially overlaps a gate region and a storage node contact region of an active region disposed on a semiconductor substrate. The semiconductor device includes an active region and a device isolation region defining the active region disposed in a semiconductor substrate, a gate electrode, wherein a line width of the gate electrode in the active region is greater than that in the device isolation region, and a zigzag W-STAR gate region, wherein the waved portion of the zigzag W-STAR gate region partially overlaps the gate region and the storage node contact region in the active region.