The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 13, 2010
Filed:
Oct. 26, 2007
Myoung Choul Choi, Seoul, KR;
Jong Shin Yoo, Daejeon, KR;
Hyun Sik Kim, Daejeon, KR;
Korea Basic Science Institute, Daejeon, KR;
Abstract
A differential pumping system in which a vacuum chamber is manufactured to have a plurality of vacuum pumps and conductance limit plates between the vacuum pumps. The differential pumping system in which an ion is implanted from an ionization source, passes through the vacuum chamber and is detected by a detection unit includes a plurality of vacuum pumps in the vacuum chamber and one or more conductance limit plates between the vacuum pumps, and the conductance limit plates form an angle less than 90° with the transmission direction of the ion. According to such a constitution, higher degree of vacuum and the ion transmission efficiency are maintained without increasing the length of the vacuum chamber. Furthermore, it is possible to minimize the attenuation of an ion detection signal due to a collision with a neighboring neutral molecule, improving the sensitivity of an ion detection device.