The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 13, 2010

Filed:

Feb. 15, 2008
Applicants:

Blake Koelmel, Mountain View, CA (US);

Robert C. Mcintosh, San Jose, CA (US);

David D L Larmagnac, Pontcharra, FR;

Alexander N. Lerner, San Jose, CA (US);

Abhilash J. Mayur, Salinas, CA (US);

Joseph Yudovsky, Campbell, CA (US);

Inventors:

Blake Koelmel, Mountain View, CA (US);

Robert C. McIntosh, San Jose, CA (US);

David D L Larmagnac, Pontcharra, FR;

Alexander N. Lerner, San Jose, CA (US);

Abhilash J. Mayur, Salinas, CA (US);

Joseph Yudovsky, Campbell, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method and apparatus for thermally processing a substrate is provided. A substrate is disposed within a processing chamber configured for thermal processing by directing electromagnetic energy toward a surface of the substrate. An energy blocker is provided to block at least a portion of the energy directed toward the substrate. The blocker prevents damage to the substrate from thermal stresses as the incident energy approaches an edge of the substrate.


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