The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 13, 2010
Filed:
Jan. 12, 2007
Byung-kyu Lee, Gangnam-gu, KR;
No-yeol Park, Seongnam-si, KR;
Jin-seung Sohn, Gangnam-gu, KR;
Seong-yong Yoon, Suwon-si, KR;
Byung-kyu Lee, Gangnam-gu, KR;
No-yeol Park, Seongnam-si, KR;
Jin-seung Sohn, Gangnam-gu, KR;
Seong-yong Yoon, Suwon-si, KR;
Samsung Electronics Co., Ltd., Suwon-si, KR;
Abstract
A patterned medium and a method of manufacturing the same are provided. The patterned medium includes a data region having a plurality of recording dots arrayed along a plurality of tracks; and a non-data region comprising a part of the patterned medium other than the data region, the non-data region having a plurality of pattern marks. The method includes depositing an aluminum layer on a base substrate; depositing a photo-resist on the aluminum layer; forming a pattern on the photo-resist using a lithography process; forming a fine pattern by forming a plurality of cavities on a portion of the aluminum layer which is exposed through the photo-resist; removing the photo-resist; forming a mold pattern; imprinting the mold pattern on a media substrate to form cavities on the media substrate; and filling the cavities with a recording material.