The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 13, 2010
Filed:
Nov. 29, 2004
Wenbin Liang, Sugar Land, TX (US);
David B. Ramsey, Angleton, TX (US);
Staci A. Dekunder, Pearland, TX (US);
Kalyan Sehanobish, Rochester Hills, MI (US);
Jesus Nieto, Cambrils, ES;
John L. Presa, Brazoria, TX (US);
Shaun E. Pirtle, Brazoria, TX (US);
Wenbin Liang, Sugar Land, TX (US);
David B. Ramsey, Angleton, TX (US);
Staci A. DeKunder, Pearland, TX (US);
Kalyan Sehanobish, Rochester Hills, MI (US);
Jesus Nieto, Cambrils, ES;
John L. Presa, Brazoria, TX (US);
Shaun E. Pirtle, Brazoria, TX (US);
Dow Global Technologies Inc., Midland, MI (US);
Abstract
Stretch films which exhibit good puncture and impact resistance while also exhibiting resistance to defect propagation are desired. The films of the present invention have an ultimate stretch of at least 200 percent, a dart impact strength of at least about 700 gms/mil and a catastrophic failure stretch of at least 95 percent of the elongation to break value (CF of 5 or less). The films preferably comprise at least 3 layers and preferably comprise at least 50 percent by weight of polyethylene polymers.