The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 13, 2010
Filed:
Nov. 11, 2004
Takayuki Kuwahara, Suwa, JP;
Shinichi Yotsuya, Chino, JP;
Takayuki Kuwahara, Suwa, JP;
Shinichi Yotsuya, Chino, JP;
Seiko Epson Corporation, , JP;
Abstract
A mask includes a substrate which includes a front side and a back side and is provided with through-holes; and a film which adjusts a shape of the substrate provided above at least one of the front side and the back side of the substrate. A method of manufacturing a mask includes the steps of: providing a substrate having a front side and a back side; forming a film which adjusts a shape of the substrate above at least one of the front side and the back side of the substrate; and drilling through-holes in the substrate.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile