The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 13, 2010
Filed:
May. 21, 2004
Se-woong Park, Daejeon, KR;
Wan-jae Myeong, Daejeon, KR;
Jin-soo Baik, Daejeon, KR;
Chang-mo Chung, Daejeon, KR;
Kyu-ho Song, Daejeon, KR;
Se-Woong Park, Daejeon, KR;
Wan-Jae Myeong, Daejeon, KR;
Jin-Soo Baik, Daejeon, KR;
Chang-Mo Chung, Daejeon, KR;
Kyu-Ho Song, Daejeon, KR;
Hanwha Chemical Corporation, Seoul, KR;
Abstract
Disclosed are a concentrate of fine ceria particles for chemical mechanical polishing, and a method of preparing the same. The method includes reacting a reactant mixture comprising i) water, ii) an aqueous solution of water-soluble cerium salt compound, and iii) ammonia or ammonium salt at a reaction temperature of 250-700? under a reaction pressure of 180-550 bar for 0.01 sec to 10 min in a continuous reactor to obtain a solution containing the fine ceria particles, the cerium salt compound being contained at an amount of 0.01 to 20 wt % in the reactant mixture; and concentrating the solution containing the fine ceria particles in a concentrator having a filter with a pore size of 0.01 to 10?. The concentrate is advantageous in that a CMP slurry and a dispersing solution are easily produced by diluting the concentrate and adding an additive to the concentrate.