The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 13, 2010
Filed:
Jan. 20, 2006
Tai-kuang Wang, Taipei, TW;
Tai-Kuang Wang, Taipei, TW;
Other;
Abstract
A manufacturing method for a seamless hat that uses cloth material having a chemical fiber component, which is cut to form cut-out pieces having specific pattern outlines, then, after affixing superimposed edges of the stitched cut-out pieces, supersonic or high frequency equipment is used to administer heat processing on the fixedly joined edges of the cut-out pieces. Thereupon, any surplus material from the stitched cut-out pieces can be cut away, only leaving the very minimum of connecting gathered edges. Then, heating art is implemented to externally apply and cover the joined areas of the gathered edges with hold-down strips containing thermosol or thermal polyurethane (TPU) membrane, thereby fabricating a hat.