The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 13, 2010
Filed:
Aug. 27, 2007
Rong-zhi Chen, Kaohsiung, TW;
Jye-long Lee, Kaohsiung, TW;
In-ting Hong, Taipei, TW;
Jui-tung Chang, Tainan, TW;
Pa-tsui Sze, Kaohsiung, TW;
Rong-Zhi Chen, Kaohsiung, TW;
Jye-Long Lee, Kaohsiung, TW;
In-Ting Hong, Taipei, TW;
Jui-Tung Chang, Tainan, TW;
Pa-Tsui Sze, Kaohsiung, TW;
China Steel Corporation, Kaohsiung, TW;
Abstract
A method for manufacturing a sputtering target includes the steps of: providing a highly pure matrix material containing a magnetic metal, and a highly pure precious metal ingot material; cleaning the surfaces of the matrix material and the precious metal ingot; vacuum melting the matrix material and the precious metal ingot to obtain a molten alloy; pouring the molten alloy in a mold having a cooling system while maintaining a surface of the molten alloy at a molten state by arc heating until the pouring is finished, thereby forming the molten alloy into a cast blank; hot working the cast blank; and annealing the cast blank after the hot working.