The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 13, 2010

Filed:

Jun. 21, 2005
Applicants:

Noboru Sasaki, Fukuoka, JP;

Hiroshi Suzuki, Koga, JP;

Fumitake Koizumi, Kumagaya, JP;

Nobuhiko Imai, Tokyo, JP;

Kunimasa Arai, Tatebayashi, JP;

Hiroyuki Konagai, Kumagaya, JP;

Inventors:

Noboru Sasaki, Fukuoka, JP;

Hiroshi Suzuki, Koga, JP;

Fumitake Koizumi, Kumagaya, JP;

Nobuhiko Imai, Tokyo, JP;

Kunimasa Arai, Tatebayashi, JP;

Hiroyuki Konagai, Kumagaya, JP;

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); C23C 14/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

This invention relates to a vacuum vapor-deposition apparatus for forming vapor-deposited films on a base film, thereby to produce vapor-deposited films, and also to a method of producing vapor-deposited films. In the vacuum vapor-deposition apparatus, the synchronizing means equalizes the circumference velocity vof the coating roll and the circumference velocity vof the takeup guide roll. Hence, v=v. Therefore, the takeup guide roll never rubs the vapor-deposited layer provided on the surface of the film. This eliminates the possibility that the vapor-deposited layer has scratches. The vapor-deposited layer can therefore possess desired properties.


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