The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 13, 2010
Filed:
Jul. 19, 2006
Applicants:
Ya-hong Xie, Beverly Hills, CA (US);
Jeehwan Kim, Los Angeles, CA (US);
Inventors:
Ya-Hong Xie, Beverly Hills, CA (US);
Jeehwan Kim, Los Angeles, CA (US);
Assignee:
The Regents of the University of California, Oakland, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/324 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method of forming a stressed thin film on a substrate includes forming a plurality of islands on a viscous layer that is present on a surface of a substrate. Adjacent islands are bridged with a stressor layer. The structure is annealed at an elevated temperature above the glass flow temperature of the viscous layer to transfer at least a portion of the stress from the stressor layer to the underlying islands. The bridges are then removed to expose the stressed islands of thin film on the substrate.