The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 06, 2010
Filed:
Aug. 27, 2007
Shimon Maeda, Tokyo, JP;
Koujirou Ohyoshi, Yokohama, JP;
Shimon Maeda, Tokyo, JP;
Koujirou Ohyoshi, Yokohama, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
A pattern producing method includes specifying a first pattern and a second pattern obtained by modifying the first pattern, specifying a correction area based on the second pattern, in a part of an area including the first pattern and the second pattern, producing at least a part of the first pattern, which is included in the correction area, as a correction target pattern, producing a part of the first or second pattern, which is not included in the correction area, as a correction reference pattern, correcting the correction target pattern on the basis of the correction target pattern and the correction reference pattern, and producing a pattern based on the corrected correction target pattern and the second pattern.