The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 06, 2010
Filed:
Mar. 11, 2008
William Wong, San Carlos, CA (US);
Scott Limb, Palo Alto, CA (US);
Michael Chabinyc, Burlingame, CA (US);
Beverly Russo, Sunnyvale, CA (US);
Rene Lujan, Sunnyvale, CA (US);
William Wong, San Carlos, CA (US);
Scott Limb, Palo Alto, CA (US);
Michael Chabinyc, Burlingame, CA (US);
Beverly Russo, Sunnyvale, CA (US);
Rene Lujan, Sunnyvale, CA (US);
Palo Alto Research Center Incorporated, Palo Alto, CA (US);
Abstract
A digital lithographic process first deposits a mask layer comprised of print patterned mask features. The print patterned mask features define gaps into which a target material may be deposited, preferably through a digital lithographic process. The target material is cured or hardened, if necessary, into target features. The mask layer is then selectively removed. The remaining target features may then be used as exposure or etch masks, physical structures such as fluid containment elements, etc. Fine feature widths, narrower the minimum width of the print patterned mask features, may be obtained while realizing the benefits of digital lithography in the manufacturing process.