The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7749676 B1

PDF
Full Text
Expired
Date of Patent:
Jul. 06, 2010

Filed:

Dec. 07, 2005
Applicants:

Se-hyung Park, Seongnam-si, KR;

Byoung-kee Kim, Yongin-si, KR;

Jong-min Park, Anyang-si, KR;

Seong-in Baek, Seoul, KR;

Inventors:

Se-Hyung Park, Seongnam-si, KR;

Byoung-Kee Kim, Yongin-si, KR;

Jong-Min Park, Anyang-si, KR;

Seong-In Baek, Seoul, KR;

Assignee:

Kolon Industries, Inc., Kwacheon-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/023 (2006.01); G03C 1/805 (2006.01);
U.S. Cl.
CPC ...
Abstract

A positive type photoresist resin film contains a support film and a positive photoresist resin layer laminated over the support film. The peak height (Rp) of the support film is less than about 300 nm to eliminate fish eye defects. The positive photoresist resin layer may contain alkali soluble resin, a diazide based photosensitive compound, a plasticizer and, optionally, a sensitivity enhancer and a releasing agent.


Find Patent Forward Citations

Park, Se-Hyung. (2010). Positive type dry film photoresist and composition for preparing the same (U.S. Patent No. 7749676). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7749676

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