The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 06, 2010
Filed:
Apr. 21, 2005
Tomohiro Yamada, Yokohama, JP;
Eiji Shidoji, Yokohama, JP;
Akira Mitsui, Yokohama, JP;
Takuji Oyama, Yokohama, JP;
Toshihisa Kamiyama, Takasago, JP;
Tomohiro Yamada, Yokohama, JP;
Eiji Shidoji, Yokohama, JP;
Akira Mitsui, Yokohama, JP;
Takuji Oyama, Yokohama, JP;
Toshihisa Kamiyama, Takasago, JP;
Asahi Glass Company, Limited, Tokyo, JP;
Abstract
A multilayer film-coated substrate having the stress of the film relaxed by depositing a multilayer film comprising a metal oxide film and a silicon oxide film on a substrate at a high speed by a sputtering method using a conductive sputtering material, and a process for producing a multilayer film-coated substrate having such a low stress, are presented. A multilayer film-coated substrate comprising a substrate and at least a metal oxide film and a silicon oxide film laminated thereon repeatedly at least once, wherein at least one layer of said metal oxide film is a metal oxide film deposited by sputtering by using, as the target material, a metal oxide MOwhich is deficient in oxygen than the stoichiometric composition, to have the oxygen deficiency resolved, and the stress of the multilayer film is from −100 MPa to +100 MPa.