The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 06, 2010

Filed:

Jun. 22, 2006
Applicants:

Soonhwa Jung, Daejeon, KR;

Gyeayoung Kwak, Daejeon, KR;

Ju Hwa Cheong, Daejeon, KR;

Wonho Lee, Daejeon, KR;

Inventors:

Soonhwa Jung, Daejeon, KR;

Gyeayoung Kwak, Daejeon, KR;

Ju Hwa Cheong, Daejeon, KR;

Wonho Lee, Daejeon, KR;

Assignee:

LG Chem, Ltd., Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01J 19/08 (2006.01);
U.S. Cl.
CPC ...
Abstract

An apparatus for converting gas using gliding plasma. The apparatus includes: a reaction chamber; an electrode member inside the reaction chamber and insulated from the reaction chamber; a power source applying electricity to the reaction chamber and the electrode member; a magnetic field generating unit installed outside the reaction chamber to rotate plasma induced inside the reaction chamber in a circumferential direction of the electrode member for forming a plasma region; and a gas supplying unit supplying material gas into the reaction chamber to allow the material gas to pass through the plasma region for converting the material gas into a different gas by energy received from the plasma. In the gas conversion apparatus, the plasma region can be widely formed in the reaction chamber to increase gas conversion rate.


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