The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 06, 2010
Filed:
Mar. 17, 2006
James F. Zucherman, San Francisco, CA (US);
Ken Y. Hsu, San Francisco, CA (US);
Charles J. Winslow, Walnut Creek, CA (US);
John J. Flynn, West Milford, NJ (US);
Steve Mitchell, Pleasant Hill, CA (US);
Scott A. Yerby, Montara, CA (US);
John A. Markwart, Castro Valley, CA (US);
James F. Zucherman, San Francisco, CA (US);
Ken Y. Hsu, San Francisco, CA (US);
Charles J. Winslow, Walnut Creek, CA (US);
John J. Flynn, West Milford, NJ (US);
Steve Mitchell, Pleasant Hill, CA (US);
Scott A. Yerby, Montara, CA (US);
John A. Markwart, Castro Valley, CA (US);
Kyphon SARL, Neuchâtel, CH;
Abstract
Systems and method in accordance with an embodiment of the present invention can includes an implant comprising a first wing, a spacer extending from the first wing, and a distraction guide. The distraction guide is arranged in a first configuration to pierce and/or distract tissue associated with adjacent spinous processes extending from vertebrae of a targeted motion segment. The implant can be positioned between the adjacent spinous processes and once positioned, the implant can be arranged in a second configuration. When arranged in a second configuration, the distraction guide can act as a second wing. The first wing and the second wing can limit or block movement of the implant along a longitudinal axis of the implant.