The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 29, 2010
Filed:
Jun. 30, 2006
Troy Chinen, Fremont, CA (US);
Thomas Leung, San Jose, CA (US);
Troy Chinen, Fremont, CA (US);
Thomas Leung, San Jose, CA (US);
Fujifilm Corporation, Tokyo, JP;
Abstract
An exemplary illumination normalization method is provided which includes receiving an input image having at least one spurious edge directly resulting from illumination, performing anisotropic diffusion on the input image to form a diffusion image, and removing at the least one spurious edge using the diffusion image. Another embodiment consistent with the invention is an apparatus for performing illumination normalization in an image which includes a processor operably coupled to a memory storing input image data which contains an object of interest having at least one spurious edge directly resulting from illumination, a model of a representative object of interest, and functional processing units for controlling image processing, wherein the functional processing units further include a model based anisotropic diffusion module which predicts edge information regarding the object of interest based upon the model, and produces a reflectance estimation utilizing the predicted edge information.