The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 29, 2010

Filed:

Mar. 16, 2006
Applicants:

Naruhiro Masui, Kanagawa, JP;

Hidetoshi Ema, Kanagawa, JP;

Inventors:

Naruhiro Masui, Kanagawa, JP;

Hidetoshi Ema, Kanagawa, JP;

Assignee:

Ricoh Company, Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H04L 7/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Serially transferred data is over sampled with a multiphase clock signal generated as a result of shifting a predetermined frequency clock signal by a predetermined phase each, to obtain over sampling data; generating clock patterns, having mutually different phase states according to a data phase state of the over sampling data. A first phase pattern generated from the over sampling data is compared with a second phase pattern generated from the clock pattern, and the number of bits to extract from the over sampling data is controlled. A phase error of the over sampling data is detected based on the first phase pattern and the second phase pattern. Bits to extract from the over sampling data is selected to restore the data based on the phase state of the clock pattern and the phase error.


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