The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 29, 2010
Filed:
Oct. 16, 2006
Thomas Kirchmeier, Teningen, DE;
Ekkehard Mann, Gundelfingen, DE;
Michael Glück, Freiburg, DE;
Christoph Hofstetter, Teningen, DE;
Christoph Gerhardt, Freiburg, DE;
Gerd Hintz, Pfaffenweiler, DE;
Thomas Kirchmeier, Teningen, DE;
Ekkehard Mann, Gundelfingen, DE;
Michael Glück, Freiburg, DE;
Christoph Hofstetter, Teningen, DE;
Christoph Gerhardt, Freiburg, DE;
Gerd Hintz, Pfaffenweiler, DE;
HUETTINGER Elektronik GmbH + Co. KG, Freiburg, DE;
Abstract
The power output of an RF plasma supply device is controlled by producing at least a first and second RF power signal by means of a respective RF generator, coupling at least two RF power signals into a coupled RF power, and distributing the coupled RF power between a plasma power that is to be supplied to a plasma load and an equalizing power that is to be supplied to an equalizing load. The power output is controlled by adjusting the levels and/or the phase position of the RF power signals in such a manner that, for plasma power in the range between a predefined lower power limit and a predefined nominal power, an insignificant portion of the coupled RF power constitutes the equalizing power and, for plasma power below the predefined lower power limit, a significant portion of the coupled RF power constitutes the equalizing power.