The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 29, 2010
Filed:
Oct. 03, 2007
Applicants:
George T. Wang, Albuquerque, NM (US);
Qiming LI, Albuquerque, NM (US);
J. Randall Creighton, Albuquerque, NM (US);
Inventors:
George T. Wang, Albuquerque, NM (US);
Qiming Li, Albuquerque, NM (US);
J. Randall Creighton, Albuquerque, NM (US);
Assignee:
Sandia Corporation, Albuquerque, NM (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/205 (2006.01); C30B 25/00 (2006.01); C30B 29/38 (2006.01); C30B 29/60 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method for forming vertically oriented, crystallographically aligned nanowires (nanocolumns) using monolayer or submonolayer quantities of metal atoms to form uniformly sized metal islands that serve as catalysts for MOCVD growth of Group III nitride nanowires.