The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 29, 2010

Filed:

Oct. 31, 2007
Applicants:

Chad A. Mirkin, Wilmette, IL (US);

Seunghun Hong, Chicago, IL (US);

Vinayak P. Dravid, Glenview, IL (US);

Inventors:

Chad A. Mirkin, Wilmette, IL (US);

Seunghun Hong, Chicago, IL (US);

Vinayak P. Dravid, Glenview, IL (US);

Assignee:

Northwestern University, Evanson, IL (US);

Attorney:
Int. Cl.
CPC ...
B05D 1/28 (2006.01); B05D 3/14 (2006.01);
U.S. Cl.
CPC ...
Abstract

In one aspect, a method of nanolithography is provided, the method comprising providing a substrate; providing a scanning probe microscope tip; coating the tip with a deposition compound; and subjecting said coated tip to a driving force to deliver said deposition compound to said substrate so as to produce a desired pattern. Another aspect of the invention provides a tip for use in nanolithography having an internal cavity and an aperture restricting movement of a deposition compound from the tip to the substrate. The rate and extent of movement of the deposition compound through the aperture is controlled by a driving force.


Find Patent Forward Citations

Loading…