The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 29, 2010
Filed:
Sep. 28, 2005
Peng Liu, Beijing, CN;
Lei-mei Sheng, Beijing, CN;
Yang Wei, Beijing, CN;
Liang Liu, Beijing, CN;
LI Qian, Beijing, CN;
Zhao-fu HU, Beijing, CN;
Bing-chu Du, Beijing, CN;
Pi-jin Chen, Beijing, CN;
Shou-shan Fan, Beijing, CN;
Peng Liu, Beijing, CN;
Lei-Mei Sheng, Beijing, CN;
Yang Wei, Beijing, CN;
Liang Liu, Beijing, CN;
Li Qian, Beijing, CN;
Zhao-Fu Hu, Beijing, CN;
Bing-Chu Du, Beijing, CN;
Pi-Jin Chen, Beijing, CN;
Shou-Shan Fan, Beijing, CN;
Tsinghua University, Beijing, CN;
Hon Hai Precision Industry Co., Ltd., Tu-Cheng, Taipei Hsien, TW;
Abstract
A method for forming a patterned array of carbon nanotubes () includes the steps of: forming an array of carbon nanotubes on a substrate (); imprinting the array of carbon nanotubes using a molding device () with a predetermined pattern; and removing the molding device, thereby leaving a patterned array of carbon nanotubes (). The method can effectively reduce or even eliminate any shielding effect between adjacent carbon nanotubes, and is simple to implement. The field emission performance of the patterned array of carbon nanotubes is improved.