The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 22, 2010
Filed:
Dec. 06, 2005
Tomoki Watabe, Saitama, JP;
Tsukasa Sugino, Saitama, JP;
Koji Kawabe, Saitama, JP;
Minami Asatani, Saitama, JP;
Taku Osada, Saitama, JP;
Takahide Yoshiike, Saitama, JP;
Takashi Nakayama, Saitama, JP;
Shintarou Fujita, Saitama, JP;
Tomoki Watabe, Saitama, JP;
Tsukasa Sugino, Saitama, JP;
Koji Kawabe, Saitama, JP;
Minami Asatani, Saitama, JP;
Taku Osada, Saitama, JP;
Takahide Yoshiike, Saitama, JP;
Takashi Nakayama, Saitama, JP;
Shintarou Fujita, Saitama, JP;
Honda Motor Co., Ltd., Minato-ku, Tokyo, JP;
Abstract
Disclosed is a space-saving autonomous mobile robot capable of switching two types of light irradiation appropriately. The robot includes a moving mechanism, an autonomous movement controller for controlling the moving mechanism, a self-location recognition unit for sensing a self-location of the robot, a map data storage unit for storing a map data on locations of marks, a slit light device for irradiating a detection area with slit light, an infrared device for irradiating a detection area with infrared rays, and a switch determination unit for comparing a mark-formed region and the self-location, and then, for switching between the slit light and infrared devices, based on the comparison result. Moreover, the infrared device irradiates the detection area when the self-location is within the mark-formed region, while the slit light device irradiates the detection area when the self-location is outside the mark-formed region.